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Published in 2021 at "AIP Advances"
DOI: 10.1063/5.0048110
Abstract: Fabricating Zn1−xMgxO films with a high Mg content is key to their applications in deep-ultraviolet optoelectronic devices. In this work, we report the preparation of Zn1−xMgxO films on (1210)-ZnO substrates by molecular beam epitaxy. The…
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Keywords:
zno substrates;
xmgxo films;
films content;
zn1 xmgxo ... See more keywords