Electrical properties of amorphous films and crystallization of Li–Nb–O system on silicon
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DOI: 10.1007/s10854-019-01948-z
Abstract: Li–Nb–O amorphous films were deposited onto Si substrates by the radio-frequency magnetron sputtering method in an Ar environment. As-grown films are crystallized under thermal annealing (TA) at the temperature of up to 600 °C with… read more here.
Keywords: amorphous films; films crystallization; properties amorphous; electrical properties ... See more keywords