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Published in 2017 at "Journal of Materials Science: Materials in Electronics"
DOI: 10.1007/s10854-017-7266-y
Abstract: We exhibit the first nano-crystalline Ge–ZnO thin films deposited on glass and PET substrates by a thermionic vacuum arc technique. The effect of Ge doping on the structural, morphological and optical properties of ZnO:Ge films…
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Keywords:
thin films;
microscopy;
zno;
zno thin ... See more keywords
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Published in 2018 at "Journal of Materials Science: Materials in Electronics"
DOI: 10.1007/s10854-018-0406-1
Abstract: Refractive index (n), extinction coefficient (k), effective complex dielectric function (ε) and band gap energy (Eg) of p-type SnOx thin films from 0.75 to 4 eV are studied. 25 nm thick films were deposited by direct…
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Keywords:
thin films;
snox;
sno phase;
films deposited ... See more keywords
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Published in 2018 at "Journal of Materials Science: Materials in Electronics"
DOI: 10.1007/s10854-018-9477-2
Abstract: Pure titanium dioxide (TiO2) thin films were deposited and investigated as gas sensors for carbon monoxide (CO) detection. TiO2 thin films were deposited by ultrasonic spray pyrolysis technique, starting from titanium(IV) oxyacetilacetonate, onto soda-lime glass…
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Keywords:
tio2 thin;
thin films;
gas sensors;
film ... See more keywords
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Published in 2017 at "Optical and Quantum Electronics"
DOI: 10.1007/s11082-017-0910-1
Abstract: In this study, nanostructured cupric oxide (CuO) thin films were deposited using simple spray pyrolysis technique on glass substrates with a fixed temperature at 375 $$^{\circ }$$∘C. The films were deposited at different precursor molarities 0.035,…
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Keywords:
cuo;
thin films;
spray pyrolysis;
cuo thin ... See more keywords
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Published in 2018 at "Journal of Electronic Materials"
DOI: 10.1007/s11664-018-06849-1
Abstract: Mo-SnSe multilayer films were deposited by multi-step magnetron sputtering. The Mo-SnSe multilayer films are then annealed, and the new phases including SnSe2 and MoSe2 are observed by x-ray diffraction and Raman spectroscopy. Scanning electron microscopy…
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Keywords:
magnetron sputtering;
microscopy;
multilayer films;
films deposited ... See more keywords
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Published in 2018 at "Applied Surface Science"
DOI: 10.1016/j.apsusc.2018.01.288
Abstract: Abstract In the present work, V2O5 films were deposited by hydrothermal method at 230 °C for the deposition time of 4 h and 8 h and then annealed at 500 °C for 1 h and 2 h. X-ray diffraction pattern of…
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Keywords:
annealed 500;
relatively high;
showed relatively;
films deposited ... See more keywords
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Published in 2020 at "Applied Surface Science"
DOI: 10.1016/j.apsusc.2019.145106
Abstract: Abstract High power impulse magnetron sputtering (HiPIMS) technology has attracted lots of attention due to its high target ionization rate. This characteristic is desirable in preparing metal compounds with complex valence states. In the current…
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Keywords:
magnetron sputtering;
high power;
power impulse;
films deposited ... See more keywords
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Published in 2017 at "Ceramics International"
DOI: 10.1016/j.ceramint.2017.05.242
Abstract: Abstract Thanks to the intrinsic p-type conductivity, NiO films show great potential for applications in various domains. In this work, NiO x films were deposited in three dimensional physical vapor deposition (3D-PVD) system from metallic…
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Keywords:
pure oxygen;
oxygen;
optoelectronic properties;
films deposited ... See more keywords
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Published in 2019 at "Ceramics International"
DOI: 10.1016/j.ceramint.2019.04.245
Abstract: Abstract Calcium copper titanate (CCTO) thin films were deposited on indium tin oxide (ITO) substrates using radio frequency (RF) magnetron sputtering, at selected Ar:N 2 flow rates (1:1, 1:2, 1:4, and 1:6 sccm) at ambient…
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Keywords:
thin films;
films deposited;
ccto thin;
flow rate ... See more keywords
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Published in 2017 at "Electrochimica Acta"
DOI: 10.1016/j.electacta.2017.05.102
Abstract: Abstract The γ-Mo2N thin films were deposited using reactive dc magnetron sputtering, and tested as an electrode material in an aqueous solution of Li2SO4 with a working potential window of 0.05V∼-0.85 V versus SCE. The morphology,…
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Keywords:
magnetron sputtering;
thin films;
mo2n thin;
films deposited ... See more keywords
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Published in 2018 at "Fusion Engineering and Design"
DOI: 10.1016/j.fusengdes.2018.02.091
Abstract: Abstract In this paper, tungsten films were deposited on tungsten substrates by magnetron sputtering and some films were annealed at 1273 K for 1 h. Subsequently, the morphology and microstructure of as-deposited and pre-annealed films were measured…
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Keywords:
tungsten films;
helium irradiation;
films deposited;
microscopy ... See more keywords