Effects of Na Doping on Structural, Optical, and Electronic Properties of ZnO Thin Films Fabricated by Sol–Gel Technique
Sign Up to like & getrecommendations! Published in 2018 at "Journal of Electronic Materials"
DOI: 10.1007/s11664-018-6258-x
Abstract: Undoped and Na-doped ZnO thin films were fabricated by sol–gel technique on quartz glass substrates and annealed at 500°C for 1 h. The structural properties of the films were characterized using x-ray diffraction analysis, which revealed… read more here.
Keywords: thin films; gel technique; films fabricated; fabricated sol ... See more keywords
Preparation and Characterization of Thermally Stable Polybenzoxazole Copolymer Films Fabricated from Their Precursors
Sign Up to like & getrecommendations! Published in 2019 at "Fibers and Polymers"
DOI: 10.1007/s12221-019-1110-3
Abstract: The polyhydroxyamide copolymers (F-PHAs) were synthesized by low-temperature solution polycondensation of 2,2-bis(3-amino-4-hydroxyphenyl) hexafluoropropane (BAHHFP) and/or 3,3′-dihydroxybenzidine (DHB) with terephthaloyl chloride (TPC) in N,N-dimethylacetamide (DMAc) with the aid of lithium chloride (LiCl). A series of polybenzoxazole… read more here.
Keywords: polybenzoxazole copolymer; pbo; bahhfp content; films fabricated ... See more keywords
Tailoring the magnetic properties and thermal stability of FeSiAl-Al 2 O 3 thin films fabricated by hybrid oblique gradient-composition sputtering
Sign Up to like & getrecommendations! Published in 2017 at "Journal of Magnetism and Magnetic Materials"
DOI: 10.1016/j.jmmm.2017.01.002
Abstract: Abstract In this study, we systematically investigate the dynamic magnetic properties of FeSiAl-Al 2 O 3 thin films fabricated by hybrid oblique gradient-composition sputtering technique with respect to temperature ranging from 300 K to 420 K. The… read more here.
Keywords: thin films; magnetic properties; films fabricated; fesial thin ... See more keywords
Ferroelectricity of HfxZr1−xO2 thin films fabricated by 300 °C low temperature process with plasma-enhanced atomic layer deposition
Sign Up to like & getrecommendations! Published in 2019 at "Microelectronic Engineering"
DOI: 10.1016/j.mee.2019.111013
Abstract: Abstract We investigated the characteristics of 10-nm-thick ferroelectric Hf0.43Zr0.57O2 (HZO) thin films fabricated using plasma-enhanced atomic layer deposition (PE-ALD) at 300 °C with plasma O2 gas and a post metallization annealing (PMA) process at 300–400 °C. The… read more here.
Keywords: thin films; plasma enhanced; process; plasma ... See more keywords
Bright red electroluminescence from Al2O3/Eu2O3 nanolaminate films fabricated by atomic layer deposition on silicon
Sign Up to like & getrecommendations! Published in 2021 at "Scripta Materialia"
DOI: 10.1016/j.scriptamat.2021.113750
Abstract: Abstract Silicon-based metal-oxide-semiconductor light-emitting devices (MOSLEDs) based on the Al2O3/Eu2O3 nanolaminate films are fabricated by atomic layer deposition, which emit red electroluminescence (EL) peaking at 613 nm with the external quantum efficiency of 5.47% and power… read more here.
Keywords: nanolaminate films; al2o3 eu2o3; atomic layer; eu2o3 nanolaminate ... See more keywords
Characterisation of SnSe thin films fabricated by chemical molecular beam deposition for use in thin film solar cells
Sign Up to like & getrecommendations! Published in 2018 at "Solar Energy"
DOI: 10.1016/j.solener.2017.11.053
Abstract: Abstract SnSe thin films were fabricated the first time by chemical molecular beam deposition (CMBD) in atmospheric pressure hydrogen flow using polycrystalline tin selenium (SnSe) precursors. The morphological and electrical properties of the films were… read more here.
Keywords: thin films; chemical molecular; snse thin; films fabricated ... See more keywords
Ferroelectricity of pristine Hf0.5Zr0.5O2 films fabricated by atomic layer deposition
Sign Up to like & getrecommendations! Published in 2023 at "Chinese Physics B"
DOI: 10.1088/1674-1056/accff3
Abstract: Hafnium-based ferroelectric films, remaining their ferroelectricity down to nanoscale thickness, present a promising application for low-power logic devices and nonvolatile memories. It has been appealing for researchers to reduce the required temperature to obtain the… read more here.
Keywords: films fabricated; layer deposition; 5zr0 5o2; atomic layer ... See more keywords
Blue Electroluminescent Al2O3/Tm2O3 Nanolaminate Films Fabricated by Atomic Layer Deposition on Silicon
Sign Up to like & getrecommendations! Published in 2019 at "Nanomaterials"
DOI: 10.3390/nano9030413
Abstract: Realization of a silicon-based light source is of significant importance for the future development of optoelectronics and telecommunications. Here, nanolaminate Al2O3/Tm2O3 films are fabricated on silicon utilizing atomic layer deposition, and intense blue electroluminescence (EL)… read more here.
Keywords: layer; atomic layer; films fabricated; al2o3 tm2o3 ... See more keywords