Do Chemical Effects Affect the Accumulation of Structural Damage during the Implantation of Fluorine Ions into GaN?
Sign Up to like & getrecommendations! Published in 2019 at "Semiconductors"
DOI: 10.1134/s1063782619110204
Abstract: The accumulation of structural damage in GaN under irradiation with accelerated F and Ne ions with energies of 1.3 and 3.2 keV/amu is investigated. It is shown that chemical effects during implantation of fluorine ions… read more here.
Keywords: implantation fluorine; structural damage; fluorine ions; accumulation structural ... See more keywords
Nano Biomass Material functionalized by β-CD@Ce(NO)3 as a high performance adsorbent to removal of fluorine from wastewater.
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DOI: 10.2139/ssrn.4175030
Abstract: Fluorine pollution has become one of the key issues of water pollution, and the adsorption materials for efficient removal of fluorine ions have attracted much attention. It is rarely reported that the self-synthesized biomass materials… read more here.
Keywords: adsorption; fluorine ions; removal fluorine; biomass ... See more keywords