Novel Proximal Group ADMM for Placement Considering Fogging and Proximity Effects
Sign Up to like & getrecommendations! Published in 2022 at "IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems"
DOI: 10.1109/tcad.2022.3155066
Abstract: Fogging and proximity effects (FPEs) are two major factors that cause inaccurate exposure and layout pattern distortions in e-beam lithography. In this article, we propose an analytical placement algorithm that considers both FPEs. We formulate… read more here.
Keywords: proximity; novel proximal; fogging proximity; proximity effects ... See more keywords