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Published in 2021 at "Optics express"
DOI: 10.1364/oe.414584
Abstract: Defect inspection on lithographic substrates, masks, reticles, and wafers is an important quality assurance process in semiconductor manufacturing. Coherent Fourier scatterometry (CFS) using laser beams with a Gaussian spatial profile is the standard workhorse routinely…
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Keywords:
coherent fourier;
scatterometry;
angular momentum;
fourier scatterometry ... See more keywords
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Published in 2022 at "Optics letters"
DOI: 10.1364/ol.463807
Abstract: We demonstrate that the sensitivity of nanoparticle detection on surfaces can be substantially improved by implementing synthetic optical holography (SOH) in coherent Fourier scatterometry (CFS), resulting in a phase-sensitive confocal differential detection technique that operates…
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Keywords:
nanoparticle detection;
fourier scatterometry;
synthetic optical;
detection ... See more keywords