Fabrication of a fractal pattern device for focus characterizations of X-ray imaging systems by Si deep reactive ion etching and bottom-up Au electroplating.
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DOI: 10.1364/ao.456427
Abstract: Precisely aligned optical components are crucial prerequisites for X-ray tomography at high resolution. We propose a device with a fractal pattern for precise automatic focusing. The device is etched in a Si substrate by deep… read more here.
Keywords: ion etching; fractal pattern; bottom electroplating; reactive ion ... See more keywords