Photopatterning Freestanding Chiral Nematic Mesoporous Organosilica Films
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DOI: 10.1002/adfm.201703346
Abstract: Chiral nematic mesoporous organosilica (CNMO) films are functionalized with a mixture of hydrophobic silanes and spiropyran compounds to create freestanding photochromic films that can be used for reversible photopatterning. The mesoporosity and interconnected pore structure… read more here.
Keywords: mesoporous organosilica; chiral nematic; nematic mesoporous; freestanding chiral ... See more keywords