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Published in 2018 at "IEEE Electron Device Letters"
DOI: 10.1109/led.2018.2807389
Abstract: In this letter, Gate-All-Around (GAA) nanowire (NW) p-MOSFETs with new approaches to fabricate totally isolated channels in replacement metal gate (RMG) are reported for the first time. Few reformed fin forming processes based on conventional…
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Keywords:
short channel;
nanowire mosfets;
process;
gaa nanowire ... See more keywords