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Published in 2017 at "Journal of Electronic Materials"
DOI: 10.1007/s11664-017-5534-5
Abstract: High-quality indium gallium zinc aluminum oxide (IGZAO) thin films with various Al contents have been deposited using the vapor cooling condensation method. The electron mobility of the IGZAO films was improved by 89.4% on adding…
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Keywords:
gallium zinc;
performance;
film;
stability ... See more keywords
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Published in 2017 at "Journal of Electronic Materials"
DOI: 10.1007/s11664-017-5946-2
Abstract: To study the self-heating effect, aluminum oxide (Al2O3) barrier layers of various thicknesses have been inserted between the channel layer and insulator layer in bottom-gate-type indium gallium zinc aluminum oxide (IGZAO) thin-film transistors (TFTs). Each…
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Keywords:
gallium zinc;
layer;
aluminum oxide;
al2o3 barrier ... See more keywords
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Published in 2018 at "Korean Journal of Chemical Engineering"
DOI: 10.1007/s11814-018-0034-8
Abstract: Plasma damage of indium-gallium-zinc-oxide (IGZO) thin film transistor (TFT) was investigated. The IGZO TFT was fabricated and the performance was measured before and after BCl3 and/or Cl2 plasma treatment to evaluate the IGZO damage. The…
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Keywords:
gallium zinc;
thin film;
zinc oxide;
damage ... See more keywords
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Published in 2018 at "Materials Today Physics"
DOI: 10.1016/j.mtphys.2018.08.001
Abstract: The authors thank Walter Ho and Ulf Lampe for their help. This project is supported by the Research Grants Council of Hong Kong grant RGC 16304314 and the collaborative grant KAUST18SC01 and URF/1/3435. R. L.…
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Keywords:
giant enhancement;
gallium zinc;
ultrathin gallium;
arrays ultrathin ... See more keywords
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Published in 2023 at "Applied Physics Letters"
DOI: 10.1063/5.0140953
Abstract: We investigate the low-frequency noise characteristics of indium–gallium–zinc oxide ferroelectric thin-film transistors (FeTFTs) with a metal–ferroelectric–metal–insulator–semiconductor (MFMIS) structure. MFMIS FeTFTs are fabricated with different metal-to-FE area ratios (AM/AF's). It is revealed that the noise generation…
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Keywords:
gallium zinc;
noise characteristics;
low frequency;
frequency noise ... See more keywords
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Published in 2019 at "Materials Research Express"
DOI: 10.1088/2053-1591/ab11a5
Abstract: Amorphous indium gallium zinc oxide (a-IGZO) are promising for developing thin film transistors (TFTs) because of their large electron mobility, small threshold voltage (Vth), and low temperature fabrication process. In this study, we have investigated…
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Keywords:
amorphous indium;
indium gallium;
thin film;
effect ... See more keywords
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Published in 2020 at "IEEE Electron Device Letters"
DOI: 10.1109/led.2020.2996242
Abstract: A heterojunction diode between n-type amorphous indium-gallium-zinc-oxide (a-IGZO) and p-type nickel oxide is experimentally demonstrated with self-aligned junction termination. The diode has an abrupt, non-destructive breakdown behavior, and the avalanche breakdown is confirmed by the…
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Keywords:
indium gallium;
gallium zinc;
zinc oxide;
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Published in 2020 at "IEEE Transactions on Electron Devices"
DOI: 10.1109/ted.2020.3012945
Abstract: High-voltage amorphous indium–gallium–zinc oxide thin-film transistors can be monolithically integrated into the system-on-chip platform as input–output bridges. However, a transient instability showing substantial ON-current degradation under high drain bias is discovered. This drain-bias transient instability…
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Keywords:
amorphous indium;
instability;
drain bias;
indium gallium ... See more keywords
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Published in 2021 at "IEEE Transactions on Electron Devices"
DOI: 10.1109/ted.2021.3113893
Abstract: We report high-performance amorphous Indium-Gallium-Zinc-Oxide nanowire field-effect transistors (α -IGZO NW-FETs) featuring an ultrascaled nanowire width ( $W_{NW}$ ) down to ~20 nm. The device with 100 nm channel length ( $L_{CH}$ ) and ~25…
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Keywords:
gallium zinc;
oxide igzo;
indium gallium;
zinc oxide ... See more keywords
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Published in 2021 at "Micromachines"
DOI: 10.3390/mi12050481
Abstract: Oxide thin-film transistors (TFTs), including indium–gallium–zinc oxide (IGZO) TFTs, have been widely investigated because of their excellent properties, such as compatibility with flexible substrates, high carrier mobility, and easy-to-fabricate TFT processes. However, to increase the…
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Keywords:
gallium zinc;
thin film;
oxide thin;
silane based ... See more keywords
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Published in 2021 at "Nanomaterials"
DOI: 10.3390/nano11020522
Abstract: In this work, we performed a systematic study of the physical properties of amorphous Indium–Gallium–Zinc Oxide (a-IGZO) films prepared under various deposition pressures, O2/(Ar+O2) flow ratios, and annealing temperatures. X-ray reflectivity (XRR) and microwave photoconductivity…
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Keywords:
gallium zinc;
amorphous indium;
zinc oxide;
performance ... See more keywords