Carbon induced galvanic etching of silicon in aerated HF/H2O vapor
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DOI: 10.1016/j.corsci.2019.05.031
Abstract: Abstract Metal-assisted chemical etching of silicon in HF aqueous solutions has aroused great interest due to its potential applications in photovoltaic, thermoelectric, sensors, and batteries. In this work, an alternative carbon induced galvanic etching of… read more here.
Keywords: h2o vapor; etching silicon; galvanic etching; silicon ... See more keywords