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Published in 2020 at "Journal of Computational Electronics"
DOI: 10.1007/s10825-020-01503-8
Abstract: A new two-dimensional analytical model is proposed for the electrical attributes of a gate-all-around heterojunction tunnel field-effect transistor, including the potential distribution, lateral and vertical electric fields, drain current, subthreshold swing, and threshold voltage. The…
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Keywords:
analytical model;
depletion regions;
field;
model ... See more keywords
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Published in 2019 at "Nano Research"
DOI: 10.1007/s12274-019-2292-0
Abstract: AbstractUsing capacitance, conductance and noise measurements, we investigate the trapping behavior at the surface and in the core of triangular-shaped one-dimensional (1D) array of GaN nanowire gate-all-around field effect transistor (GAA FET), fabricated via a…
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Keywords:
surface core;
gan nanowire;
noise;
nanowire gate ... See more keywords
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Published in 2020 at "Silicon"
DOI: 10.1007/s12633-020-00559-2
Abstract: In this brief, the center potential based analysis of Si and AlGaN/GaN gate all around field effect transistors (GAA-FET) is presented. The center potential is calculated for different values of channel length, channel height, doping…
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Keywords:
iii;
potential based;
gate around;
center potential ... See more keywords
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Published in 2017 at "Materials Science in Semiconductor Processing"
DOI: 10.1016/j.mssp.2016.10.044
Abstract: Abstract Epitaxial growth of strained and defect free SiGe layers grown with disilane and digermane was investigated. This precursors set allows to cover a broad range of Ge concentration (15–65%) at low temperatures (400–550 °C). It…
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Keywords:
growth;
gate around;
growth rate;
sige growth ... See more keywords
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Published in 2020 at "Results in physics"
DOI: 10.1016/j.rinp.2019.102823
Abstract: Abstract In this paper, we consider the electrical performance of a circular cross section gate all around-field effect transistor (GAA-FET) in which gate dielectric coverage with high-k dielectric (HfO2) over the channel region has been…
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Keywords:
around field;
gate;
coverage;
effect transistor ... See more keywords
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Published in 2017 at "Solid-state Electronics"
DOI: 10.1016/j.sse.2016.12.008
Abstract: Abstract A vertical MOS architecture implemented on Si nanowire (NW) array with a scaled Gate-All-Around (14 nm) and symmetrical diffusive S/D contacts is presented with noteworthy demonstrations in both processing (layer engineering at nanoscale), and in…
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Keywords:
around field;
transistors vertical;
sub gate;
effect transistors ... See more keywords
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Published in 2017 at "Solid-state Electronics"
DOI: 10.1016/j.sse.2017.10.017
Abstract: Abstract In this paper, the gate-induced drain leakage (GIDL) is analyzed on gate-all-around (GAA) Nanowire FET (NW FET) with ellipse-shaped channel induced by process variation effect (PVE). The fabrication process of nanowire can lead to…
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Keywords:
nanowire fet;
fet;
gate;
effect ... See more keywords
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Published in 2019 at "Solid-State Electronics"
DOI: 10.1016/j.sse.2019.107642
Abstract: Abstract In this paper we investigate the optimized design of a short channel gate-all-around-junctionless (GAAJ) metal-oxidesemiconductor field-effect-transistor (MOSFET), including the source-drain extensions, by means of genetic algorithm solutions applied to a compact current-voltage analytical model.…
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Keywords:
channel;
channel gate;
gate around;
short channel ... See more keywords
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Published in 2020 at "Semiconductor Science and Technology"
DOI: 10.1088/1361-6641/ab6bab
Abstract: The gate-all-around (GAA) silicon nanosheet (SiNS) metal-oxide-semiconductor field-effect transistor (MOSFET) structures have been recognized as excellent candidates to achieve improved power performance and area scaling compared to the current FinFET technologies. Specifically, SiNS structures provide…
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Keywords:
short channel;
gate;
silicon nanosheet;
gaa sins ... See more keywords
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Published in 2021 at "Semiconductor Science and Technology"
DOI: 10.1088/1361-6641/abfbb5
Abstract: We report on the nanopatterning of horizontal and vertical germanium-tin (Ge1−x Sn x or GeSn) nanowires by inductively coupled plasma reactive ion etching for gate-all-around field effect transistors. First, a chlorine based chemistry has been…
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Keywords:
around field;
gesn nanowires;
plasma etching;
gesn ... See more keywords
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Published in 2019 at "IEEE Sensors Journal"
DOI: 10.1109/jsen.2018.2887277
Abstract: This paper investigates the role of a hetero-junction p-i-n gate all around tunnel FET architecture for biosensing applications. The device offers a better sensitivity and has been modeled in terms of various parameters such as…
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Keywords:
gasb inas;
around biotunnel;
gate;
model gasb ... See more keywords