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Published in 2019 at "Silicon"
DOI: 10.1007/s12633-019-00220-7
Abstract: The evolution of integrated circuit is based on the miniaturization of dimension in the transistor Mosfet, this reduction causes the undesirable effect: short channel effects (SCE) and hot carrier effect, the principal goal is to…
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Keywords:
high dielectric;
gate length;
gate;
effect ... See more keywords
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Published in 2021 at "AEU - International Journal of Electronics and Communications"
DOI: 10.1016/j.aeue.2021.153774
Abstract: Abstract The dc and high frequency performances of Al composition Graded Channel AlGaN/GaN high electron mobility transistor on GaN substrate was investigated and compared with Conventional AlGaN/GaN HEMT. The high frequency characteristics were measured on…
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Keywords:
algan gan;
gan hemt;
drain current;
graded channel ... See more keywords
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Published in 2021 at "ACS applied materials & interfaces"
DOI: 10.1021/acsami.1c05229
Abstract: Single-walled carbon nanotubes (CNTs) have been considered as a promising semiconductor to construct transistors and integrated circuits in the future owing to their ultrathin channel thickness and ultrahigh injection velocity. Although a 5 nm gate-length…
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Keywords:
length;
sub gate;
gate length;
performance ... See more keywords
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1
Published in 2019 at "IEEE Journal of the Electron Devices Society"
DOI: 10.1109/jeds.2019.2909751
Abstract: We fabricated a field-effect transistor (FET) with a gate length of 21 nm whose channel material is a ${c}$ -axis-aligned crystalline In-Ga-Zn oxide (CAAC-IGZO). A CAAC-IGZO FET with a gate length of 21 nm has…
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Keywords:
fet gate;
memory;
gate length;
axis aligned ... See more keywords
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1
Published in 2017 at "IEEE Electron Device Letters"
DOI: 10.1109/led.2016.2629420
Abstract: In this letter, we have studied the impact on lateral nanowire transistor's (LNW) performance of reducing the wire diameter from 7 nm to 5 nm. As technology scaling continues, the LNW device size is scaled…
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Keywords:
gate length;
wire diameter;
lateral nanowire;
diameter ... See more keywords
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1
Published in 2017 at "IEEE Transactions on Electron Devices"
DOI: 10.1109/ted.2016.2644719
Abstract: 2-D transition metal dichalcogenide (TMDC) FETs are promising devices for scaling beyond end of silicon CMOS nanoelectronics. By solving the quantum transport equation self-consistently with the Poisson equation, we explore the performance potential of TMDC…
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Keywords:
length;
gate length;
transition metal;
metal dichalcogenide ... See more keywords
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1
Published in 2018 at "IEEE Transactions on Electron Devices"
DOI: 10.1109/ted.2017.2786144
Abstract: This paper utilizes electrical analyses and a study of physical mechanisms to investigate metal gate structure-dependent performance in amorphous InGaZnO (a-IGZO) thin-film transistors. The effects of different shielding areas between the IGZO layer and metal…
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Keywords:
metal gate;
light illumination;
gate length;
gate ... See more keywords