Plasma-induced chemical etching generating Ni3S2 for formaldehyde detection
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DOI: 10.1016/j.cclet.2021.09.024
Abstract: ABSTRACT In this paper, Ni3S2 nanosheet (NS) was generated by chemical etching with sodium sulfide directly on the nickel foam (NF), which was induced by dielectric barrier discharge plasma in liquid. Compared with other chemical… read more here.
Keywords: detection; plasma induced; induced chemical; generating ni3s2 ... See more keywords