UV Nanoimprint Lithography: Geometrical Impact on Filling Properties of Nanoscale Patterns
Sign Up to like & getrecommendations! Published in 2021 at "Nanomaterials"
DOI: 10.3390/nano11030822
Abstract: Ultraviolet (UV) Nanoimprint Lithography (NIL) is a replication method that is well known for its capability to address a wide range of pattern sizes and shapes. It has proven to be an efficient production method… read more here.
Keywords: impact filling; pattern; lithography geometrical; nanoimprint ... See more keywords