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Published in 2020 at "Biomicrofluidics"
DOI: 10.1063/1.5139031
Abstract: The negative tone photoresist SU-8 permits the creation of micrometer-scale structures by optical lithography. It is also the most used photoresist in soft lithography for the fast-prototyping of microfluidic devices. Despite its importance, the effect…
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Keywords:
geometrical transitions;
transitions circular;
distinct geometrical;
exhibits distinct ... See more keywords