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Published in 2020 at "Acta Materialia"
DOI: 10.1016/j.actamat.2020.09.047
Abstract: Abstract High-quality germanium epilayers on Si with low threading-dislocation density were achieved by sintering of porous Ge/Si films. The process consists in the formation of porous Ge nanostructures by dislocation-selective electrochemical etching of Ge/Si films,…
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Keywords:
sintering germanium;
effect sintering;
germanium;
germanium epilayers ... See more keywords