A global plasma model for reactive deposition of compound films by modulated pulsed power magnetron sputtering discharges
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DOI: 10.1063/1.4977471
Abstract: A spatially averaged, time-dependent global plasma model has been developed to describe the reactive deposition of a TiAlSiN thin film by modulated pulsed power magnetron sputtering (MPPMS) discharges in Ar/N2 mixture gas, based on the… read more here.
Keywords: plasma model; reactive deposition; power; modulated pulsed ... See more keywords