Pulsed KrF laser-assisted direct deposition of graphitic capping layer for Cu interconnect
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DOI: 10.1016/j.carbon.2017.07.075
Abstract: Abstract A graphitic capping layer was successfully formed on top of Cu interconnects at room temperature, using a pulsed KrF laser. The change in temperature of the Cu line was maintained below 380 °C during laser… read more here.
Keywords: laser; capping layer; graphitic capping; layer ... See more keywords