Thermal stability of iron silicide nanowires epitaxially grown on Si(110) substrates
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DOI: 10.1016/j.apsusc.2016.12.056
Abstract: Abstract Metallic α-FeSi 2 nanowires (NWs) are epitaxially grown on Si(110) at 650 °C. Their evolution as a function of annealing temperature has been studied in situ by scanning tunneling microscopy. The NWs are stable up… read more here.
Keywords: grown 110; stability iron; iron silicide; epitaxially grown ... See more keywords