Carbon induced galvanic etching of silicon in aerated HF/H2O vapor
Sign Up to like & getrecommendations! Published in 2019 at "Corrosion Science"
DOI: 10.1016/j.corsci.2019.05.031
Abstract: Abstract Metal-assisted chemical etching of silicon in HF aqueous solutions has aroused great interest due to its potential applications in photovoltaic, thermoelectric, sensors, and batteries. In this work, an alternative carbon induced galvanic etching of… read more here.
Keywords: h2o vapor; etching silicon; galvanic etching; silicon ... See more keywords
High reactivity of H2O vapor on GaN surfaces
Sign Up to like & getrecommendations! Published in 2022 at "Science and Technology of Advanced Materials"
DOI: 10.1080/14686996.2022.2052180
Abstract: ABSTRACT Understanding the process of oxidation on the surface of GaN is important for improving metal-oxide-semiconductor (MOS) devices. Real-time X-ray photoelectron spectroscopy was used to observe the dynamic adsorption behavior of GaN surfaces upon irradiation… read more here.
Keywords: oxidation; gan surfaces; h2o vapor; surface ... See more keywords