Effects of Electrochemical Mechanical Polishing on the Polishing Efficiency and Quality of Co with H2O2 and BTA under Alkaline Conditions
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DOI: 10.1149/2162-8777/ac3058
Abstract: With the development of technology nodes below 5 nm, cobalt has attracted extensive attention as an interconnection metal to replace Cu in the next generation of interconnection technology. Here, the appropriate concentrations of colloidal silica,… read more here.
Keywords: polishing polishing; mechanical polishing; electrochemical mechanical; h2o2 bta ... See more keywords