Effects of the Ar and He dilution gas mixture ratio on the hardness of a-C:H films synthesized by atmospheric pressure plasma enhanced chemical vapor deposition
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DOI: 10.1116/1.4983374
Abstract: Hydrogenated amorphous carbon (a-C:H) films synthesized by atmospheric-pressure plasma-enhanced chemical vapor deposition (AP-PECVD) possess a low hardness because of the large amount of incorporated hydrogen. To increase the hardness of these a-C:H films, detachment of… read more here.
Keywords: hardness films; gas; ratio; deposition ... See more keywords