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Published in 2019 at "Semiconductors"
DOI: 10.1134/s1063782619020064
Abstract: The formation features of a low-temperature Ta/Al-based ohmic contact to Al0.25Ga0.75N/GaN heteroepitaxial structures on silicon substrates are studied. The fabricated ohmic contacts based on Ta/Al/Ti (10/300/20 nm) compositions have a low contact resistance (0.4 Ω…
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Keywords:
low temperature;
heteroepitaxial structures;
temperature based;
structures silicon ... See more keywords