Organic–inorganic hybrid photoresists containing hexafluoroantimonate: design, synthesis and high resolution EUV lithography studies
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DOI: 10.1039/c7qm00343a
Abstract: Although many organic polymer based photoresists are useful for patterning high resolution sub-20 nm technology nodes, many such resists suffer from poor sensitivity. One of the methods to address the problem of low sensitivity is… read more here.
Keywords: resolution; high resolution; organic polymer; sensitivity ... See more keywords