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Published in 2017 at "Thin Solid Films"
DOI: 10.1016/j.tsf.2017.01.050
Abstract: Abstract Hf2Co11 thin films were deposited on single crystalline Si(100) substrates by using conventional direct current (DC) magnetron sputtering with a Hf2Co11 alloy target. All films were grown at room temperature with 120W sputtering power.…
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Keywords:
thin films;
coercive field;
microscopy;
room temperature ... See more keywords