A synergistic interplay between dopant ALD cycles and film thickness on the improvement of the ferroelectricity of uncapped Al:HfO2 nanofilms
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DOI: 10.1088/1361-6528/abe785
Abstract: The Al:HfO2 ferroelectric nanofilms with different total thicknesses and distributions of Al-rich strips are prepared using atomic layer deposition (ALD) in an uncapped configuration. The synergistic interplay between the number of Al-rich layers and the… read more here.
Keywords: ald cycles; ferroelectricity; film; hfo2 nanofilms ... See more keywords