Scanning probe-based nanolithography: nondestructive structures fabricated on silicon surface via distinctive anisotropic etching in HF/HNO3 mixtures
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DOI: 10.1007/s10853-020-05452-2
Abstract: HF/HNO3 mixtures were typical isotropic etching systems for processing silicon (Si) surface, and still suffer from difficulties in controllably fabricating nanostructures. Here, fast and anisotropic etching approach with HF/HNO3 mixtures was developed to overcome this… read more here.
Keywords: anisotropic etching; distinctive anisotropic; silicon surface; hno3 mixtures ... See more keywords