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Published in 2021 at "Applied Surface Science"
DOI: 10.1016/j.apsusc.2020.147859
Abstract: Abstract Chemical mechanical polishing (CMP) is the most effective technology for the global and local planarization of metal surfaces. In this study, an environment-friendly and highly efficient CMP slurry for aluminum alloy is prepared by…
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Keywords:
chemical mechanical;
aluminum alloy;
slurry;
hybrid abrasives ... See more keywords