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Published in 2022 at "Nanomaterials"
DOI: 10.3390/nano12183252
Abstract: We enhanced the device uniformity for reliable memory performances by increasing the device surface roughness by exposing the HfO2 thin film surface to argon (Ar) plasma. The results showed significant improvements in electrical and synaptic…
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Keywords:
non identical;
accuracy;
linearity;
identical pulse ... See more keywords