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Published in 2025 at "MRS Communications"
DOI: 10.1557/s43579-025-00709-w
Abstract: This work reports the role of different metal bottom electrodes such as Tungsten (W), Titanium/Ruthenium (Ti/Ru), and Scandium (Sc) on the Ferroelectric Switching of sub-100-nm Al1-xScxN thin films deposited via reactive co-sputtering techniques. The impact…
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Keywords:
interfaces ferroelectric;
impact electrodes;
thin films;
al1 xscxn ... See more keywords