Enhancement of discharge and deposition rate by imposed pulse current during the cathodic arc deposition of ta-C films
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DOI: 10.1016/j.vacuum.2021.110515
Abstract: Abstract The deposition rate of ta-C films was increased by imposed pulse cathodic arc deposition (IP-CAD). The arc discharge behavior, deposition rate and micro-hardness of the ta-C films were investigated at average arc currents (Iaverage)… read more here.
Keywords: cathodic arc; cad; imposed pulse; deposition ... See more keywords