Increased selectivity in area-selective ALD by combining nucleation enhancement and SAM-based inhibition
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DOI: 10.1557/s43578-020-00013-4
Abstract: An area-selective atomic layer deposition (AS-ALD) process is developed that achieves increased selectivity by combining two strategies: i) selective enhancement using a small molecule activator and ii) self-assembled monolayer (SAM)-based inhibition. Specifically, we show that… read more here.
Keywords: increased selectivity; based inhibition; selectivity; inhibition ... See more keywords