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Published in 2022 at "ACS nano"
DOI: 10.1021/acsnano.2c01286
Abstract: Developing a low-temperature fabrication strategy of an amorphous InGaZnO (α-IGZO) channel layer is a prerequisite for high-performance oxide-based thin film transistor (TFT) flexible device applications. Herein, an ultraviolet-assisted oxygen ambient rapid thermal annealing method (UV-ORTA),…
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Keywords:
ingazno;
low temperature;
ultraviolet assisted;
high performance ... See more keywords
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Published in 2017 at "Journal of Materials Chemistry C"
DOI: 10.1039/c6tc04709b
Abstract: Passivating trap defects and controlling carrier concentration and doping profiles in the functional dielectric and channel layers is a prerequisite for designing high performance electronic devices. Here, we investigate the effects of dielectric interface trap…
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Keywords:
modulation;
passivation;
graded channel;
ingazno ... See more keywords
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Published in 2019 at "IEEE Electron Device Letters"
DOI: 10.1109/led.2019.2933503
Abstract: Amorphous InGaZnO (a-IGZO) UV photodetectors with a metal-semiconductor-metal structure were fabricated on polyethylene terephthalate (PET) substrates, and the effects of surface fluorine plasma treatment on a-IGZO were investigated. With this treatment, the oxygen vacancies (Ovac’s)…
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Keywords:
ingazno;
treatment;
plasma treatment;
surface fluorine ... See more keywords