Intrinsic inhomogeneous barrier height at the n-TiO2/p-Si hole-blocking junction
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DOI: 10.1016/j.apsusc.2017.10.001
Abstract: Abstract Using Kelvin probe force microscopy (KPFM) and temperature-dependent current-voltage characteristics, we study the charge transport across an n-TiO2/p-Si heterojunction. In particular, the KPFM result shows a variation in the work function at the TiO2… read more here.
Keywords: inhomogeneous barrier; hole blocking; barrier; barrier height ... See more keywords