Insights to scaling remote plasma sources sustained in NF3 mixtures
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DOI: 10.1116/1.4978551
Abstract: Remote plasma sources (RPSs) are being developed for low damage materials processing during semiconductor fabrication. Plasmas sustained in NF3 are often used as a source of F atoms. NF3 containing gas mixtures such as NF3/O2… read more here.
Keywords: sustained nf3; remote plasma; insights scaling; scaling remote ... See more keywords