Precise measurement of the temperature of a silicon wafer by an optical-interference contactless thermometer during rapid plasma processing
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DOI: 10.1063/1.5143834
Abstract: Although silicon substrate temperature is known to be important in many plasma processes, measuring it involves various difficulties due to the complexity of plasmas. In previous work, the authors proposed an optical-interference contactless thermometer (OICT)… read more here.
Keywords: interference contactless; plasma; temperature; contactless thermometer ... See more keywords