Investigation of sidewall damage induced by reactive ion etching on AlGaInP MESA for micro-LED application
Sign Up to like & getrecommendations! Published in 2021 at "Journal of Luminescence"
DOI: 10.1016/j.jlumin.2021.117937
Abstract: Abstract Previous reports have studied the impact of sidewall defects on AlGaInP micro light emitting diode (μLED) only by Current-Voltage-Luminescence (I-V-L) measurements. In this work, we propose an alternative approach to investigate these defects directly… read more here.
Keywords: sidewall; reactive ion; ion etching; ion ... See more keywords
Morphologies and optical properties of black silicon by room temperature reactive ion etching
Sign Up to like & getrecommendations! Published in 2020 at "Materials Research Bulletin"
DOI: 10.1016/j.materresbull.2020.110973
Abstract: Abstract Black Silicon (BS) nanostructures fabricated by Reactive Ion Etching at Room Temperature (RT-RIE) are presented. We discuss the influence of the plasma process parameters on the silicon etching and their influence on the shape… read more here.
Keywords: reactive ion; room temperature; room; black silicon ... See more keywords
[INVITED] Sensing properties of micro-cavity in-line Mach-Zehnder interferometer enhanced by reactive ion etching
Sign Up to like & getrecommendations! Published in 2018 at "Optics and Laser Technology"
DOI: 10.1016/j.optlastec.2018.01.045
Abstract: Abstract In this work, we discuss an application of reactive ion etching (RIE) for enhancing the sensing properties of a micro-cavity in-line Mach-Zehnder interferometer (µIMZI). The µIMZI was fabricated using femtosecond laser micromachining in a… read more here.
Keywords: micro cavity; reactive ion; properties micro; cavity ... See more keywords
Preparation of composite micro/nano structure on the silicon surface by reactive ion etching: Enhanced anti-reflective and hydrophobic properties
Sign Up to like & getrecommendations! Published in 2018 at "Superlattices and Microstructures"
DOI: 10.1016/j.spmi.2018.03.035
Abstract: Abstract A silicon substrate with micro-pyramid structure (black silicon) is prepared by wet chemical etching and then subjected to reactive ion etching (RIE) in the mixed gas condition of SF6, CHF3 and He. We systematically… read more here.
Keywords: preparation composite; structure; silicon; reactive ion ... See more keywords
Synthesis of novel p-n heterojunction m-Bi2O4/BiOCl nanocomposite with excellent photocatalytic activity through ion-etching method
Sign Up to like & getrecommendations! Published in 2018 at "Chinese Journal of Catalysis"
DOI: 10.1016/s1872-2067(18)63142-0
Abstract: Abstract A novel p-n heterostructure photocatalyst m-Bi2O4/BiOCl was successfully synthetized through a facile ion-etching method. Via adjusting the added volume of HCl solution, a series of different ratios of composite photocatalysts were obtained. The as-prepared… read more here.
Keywords: etching method; ion etching; spectroscopy; bi2o4 biocl ... See more keywords
Deep reactive ion etching of cylindrical nanopores in silicon for photonic crystals
Sign Up to like & getrecommendations! Published in 2023 at "Nanotechnology"
DOI: 10.1088/1361-6528/acc034
Abstract: Periodic arrays of deep nanopores etched in silicon by deep reactive ion etching are desirable structures for photonic crystals and other nanostructures for silicon nanophotonics. Previous studies focused on realizing as deep as possible nanopores… read more here.
Keywords: ion etching; reactive ion; photonic crystals; deep reactive ... See more keywords
Fabrication of a fractal pattern device for focus characterizations of X-ray imaging systems by Si deep reactive ion etching and bottom-up Au electroplating.
Sign Up to like & getrecommendations! Published in 2022 at "Applied optics"
DOI: 10.1364/ao.456427
Abstract: Precisely aligned optical components are crucial prerequisites for X-ray tomography at high resolution. We propose a device with a fractal pattern for precise automatic focusing. The device is etched in a Si substrate by deep… read more here.
Keywords: ion etching; fractal pattern; bottom electroplating; reactive ion ... See more keywords
Characterizing the Chemical Structure of Ti3C2Tx MXene by Angle-Resolved XPS Combined with Argon Ion Etching
Sign Up to like & getrecommendations! Published in 2022 at "Materials"
DOI: 10.3390/ma15010307
Abstract: Angle-resolved XPS combined with argon ion etching was used to characterize the surface functional groups and the chemical structure of Ti3C2Tx MXene. Survey scanning obtained on the sample surface showed that the sample mainly contains… read more here.
Keywords: angle resolved; structure; argon ion; ion etching ... See more keywords
Doped or Quantum-Dot Layers as In Situ Etch-Stop Indicators for III/V Semiconductor Reactive Ion Etching (RIE) Using Reflectance Anisotropy Spectroscopy (RAS)
Sign Up to like & getrecommendations! Published in 2021 at "Micromachines"
DOI: 10.3390/mi12050502
Abstract: Reflectance anisotropy spectroscopy (RAS), which was originally invented to monitor epitaxial growth, can—as we have previously shown—also be used to monitor the reactive ion etching of III/V semiconductor samples in situ and in real time,… read more here.
Keywords: spectroscopy ras; anisotropy spectroscopy; spectroscopy; reactive ion ... See more keywords