Status monitoring of ion sputter relevant parameters of an XPS depth profiling instrument
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DOI: 10.1002/sia.6765
Abstract: An X‐ray photoelectron spectroscopy (XPS) instrument is utilized for sputter depth profiling of thin films. Relevant instrumental parameters are the ion gun sputter rate, the contamination level of the sputter ion gun, and the purity… read more here.
Keywords: instrument; sputter; ion gun; depth profiling ... See more keywords