Large plastic deformation blistering and helium retention in 5% tantalum doped tungsten under 60 keV helium ions implantation
Sign Up to like & getrecommendations! Published in 2018 at "Fusion Engineering and Design"
DOI: 10.1016/j.fusengdes.2018.06.014
Abstract: Abstract Tantalum (5 mass-% Ta) doped tungsten and pure tungsten in comparison were exposed to 60 keV helium ions implantation with a fluence of 1.04 × 1022 ion m−2. It was obvious that the W-5%Ta featured large plastic blisters… read more here.
Keywords: ions implantation; helium ions; tantalum; kev helium ... See more keywords
Effect of Cu Ions Implantation on Structural, Electronic, Optical and Dielectric Properties of Polymethyl Methacrylate (PMMA)
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DOI: 10.3390/polym13060973
Abstract: In this work, the effect of ion bombardment on the optical properties of Polymethylmethacrylate (PMMA) was studied. Polymer samples were implanted with 500 keV Cu+ ions with a fluence ranging from 1 × 1012 to… read more here.
Keywords: ions implantation; dielectric; implanted samples; effect ions ... See more keywords