One-Step Etching Characteristics of ITO/Ag/ITO Multilayered Electrode in High-Density and High-Electron-Temperature Plasma
Sign Up to like & getrecommendations! Published in 2021 at "Materials"
DOI: 10.3390/ma14082025
Abstract: This paper presents the dry etching characteristics of indium tin oxide (ITO)/Ag/ITO multilayered thin film, used as a pixel electrode in a high-resolution active-matrix organic light-emitting diode (AMOLED) device. Dry etching was performed using a… read more here.
Keywords: temperature; ito multilayered; ito; etching characteristics ... See more keywords