High-performance Ti and W co-doped indium oxide films for silicon heterojunction solar cells prepared by reactive plasma deposition
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DOI: 10.1016/j.jpowsour.2021.230101
Abstract: Abstract Titanium and tungsten co-doped indium oxide (IWTO) films are deposited via low-damage reactive plasma deposition technique at room temperature (RT) and heating temperature (HT). The effects of oxygen flow rates (FO2) on the structural,… read more here.
Keywords: indium oxide; silicon heterojunction; reactive plasma; iwto films ... See more keywords