Nucleation and growth kinetics of electrodeposited Ni films on Si(100) surfaces
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DOI: 10.1016/j.electacta.2017.02.010
Abstract: Abstract Nucleation and growth of nickel on n- and p-type Si(100) is investigated, using a plating bath composed of nickel sulphamate and boric acid. For n-type Si, the impact of applied potential and current density… read more here.
Keywords: nucleation growth; electrodeposited films; growth kinetics; films 100 ... See more keywords