Anisotropic etching of silicon in KOH + Triton X-100 for 45° micromirror applications
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DOI: 10.1007/s00542-016-3103-0
Abstract: The etching process of monocrystalline silicon in potassium hydroxide solution with addition of Triton X-100 surfactant at different temperatures is studied. It is shown that decreasing the temperature lowers etch rates and improves surface morphology… read more here.
Keywords: triton 100; koh triton; anisotropic etching; silicon ... See more keywords