KOH Wet Etching Mechanisms of III-N Nanopillars: Impact of Temperature and Concentration.
Sign Up to like & getrecommendations! Published in 2025 at "ACS applied materials & interfaces"
DOI: 10.1021/acsami.5c01180
Abstract: Combining dry and wet etching processes is a common technique to pattern III-N semiconductors integrated in optoelectronic devices with a controlled final shape and high-quality crystallographic facets. However, the wet mechanisms driving the final pattern… read more here.
Keywords: wet etching; etching mechanisms; hard mask; koh wet ... See more keywords
KOH Wet Etching Ga-Polar AlGaN Epilayer for Ultraviolet B Photodetection With Low Dark Current and High Sensitivity
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DOI: 10.1109/jsen.2024.3383372
Abstract: AlGaN ternary alloy is a potential candidate for visible blind or even solar blind photodetection application in extreme environmental conditions due to its excellent thermal stability and radiation hardness. However, the screw dislocations formed during… read more here.
Keywords: polar algan; dark current; wet etching; algan epilayer ... See more keywords
Impact of KOH Wet Treatment on the Electrical and Optical Characteristics of GaN-Based Red μLEDs
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DOI: 10.3390/cryst15040288
Abstract: Micro-size light-emitting diodes (μLEDs) are high-brightness, low-power optoelectronic devices with significant potential in display technology, lighting, and biomedical applications. AlGaInP-based red LEDs experience severe size-dependent effects when scaled to the micron level, and addressing the… read more here.
Keywords: treatment; gan based; red leds; koh wet ... See more keywords