Interfacing Low‐Temperature Atomic Layer Deposited TiO2 Electron Transport Layers with Metal Electrodes
Sign Up to like & getrecommendations! Published in 2020 at "Advanced Materials Interfaces"
DOI: 10.1002/admi.201902054
Abstract: Low‐temperature atomic layer deposited (ALD) TiO2 is an electron transport layer that is relatively unreactive with mixed halide perovskite semiconductors. This amorphous, ALD‐grown metal oxide is typically interposed between the perovskite layer and a low… read more here.
Keywords: atomic layer; layer deposited; temperature atomic; temperature ... See more keywords
Revealing the Simultaneous Effects of Conductivity and Amorphous Nature of Atomic-Layer-Deposited Double-Anion-Based Zinc Oxysulfide as Superior Anodes in Na-Ion Batteries.
Sign Up to like & getrecommendations! Published in 2019 at "Small"
DOI: 10.1002/smll.201900595
Abstract: Although sodium-ion batteries (SIBs) are considered promising alternatives to their Li counterparts, they still suffer from challenges like slow kinetics of the sodiation process, large volume change, and inferior cycling stability. On the other hand,… read more here.
Keywords: atomic layer; anion based; double anion; layer deposited ... See more keywords
Plasma Enhanced Atomic Layer Deposited HfO2 Ferroelectric Films for Non-volatile Memory Applications
Sign Up to like & getrecommendations! Published in 2019 at "Journal of Electronic Materials"
DOI: 10.1007/s11664-019-07840-0
Abstract: For this proposed work, structural, electrical and ferroelectric properties of metal-insulator-silicon (MIS) and metal-insulator-metal (MIM) capacitors with different HfO2 (5 nm, 10 nm, 15 nm, 20 nm) thicknesses deposited on silicon and TiN/Silicon were investigated. The structural properties such… read more here.
Keywords: enhanced atomic; layer; atomic layer; layer deposited ... See more keywords
GaAs metal-oxide-semiconductor push with molecular beam epitaxy Y 2 O 3 - In comparison with atomic layer deposited Al 2 O 3
Sign Up to like & getrecommendations! Published in 2017 at "Journal of Crystal Growth"
DOI: 10.1016/j.jcrysgro.2016.11.118
Abstract: Abstract In-situ molecular beam epitaxy (MBE) Y 2 O 3 films 1–2 nm thick were epitaxially grown on GaAs(001)−4×6 reconstructed surfaces. Despite a large lattice mismatch, the hetero-structure exhibits outstanding thermal stability to 900 °C with excellent… read more here.
Keywords: atomic layer; gaas; layer deposited; molecular beam ... See more keywords
Atomic-layer deposited Nb2O5 as transparent passivating electron contact for c-Si solar cells
Sign Up to like & getrecommendations! Published in 2018 at "Solar Energy Materials and Solar Cells"
DOI: 10.1016/j.solmat.2018.04.037
Abstract: Abstract Passivating contacts based on metal oxides have proven to enable high energy conversion efficiencies for crystalline silicon (c-Si) solar cells at low processing complexity. In this work, the potential of atomic-layer deposited (ALD) Nb2O5… read more here.
Keywords: atomic layer; layer deposited; contact; electron ... See more keywords
Enhancing stability for organic-inorganic perovskite solar cells by atomic layer deposited Al2O3 encapsulation
Sign Up to like & getrecommendations! Published in 2018 at "Solar Energy Materials and Solar Cells"
DOI: 10.1016/j.solmat.2018.08.016
Abstract: Abstract In this work, we employ atomic layer deposition (ALD) to form Al2O3 layer as an encapsulant for perovskite solar cells (PSCs). Al2O3 layer deposited at temperature as low as 95 °C achieves water vapor transmission… read more here.
Keywords: perovskite solar; layer; atomic layer; layer deposited ... See more keywords
Improved interfacial properties of thermal atomic layer deposited AlN on GaN
Sign Up to like & getrecommendations! Published in 2019 at "Vacuum"
DOI: 10.1016/j.vacuum.2018.10.067
Abstract: Abstract The interfacial properties of atomic layer deposited AlN on n-GaN substrate were investigated. Capacitance–voltage (C V) characteristics showed that the sample with a 24 nm thick AlN had lower interface state density than the sample… read more here.
Keywords: aln gan; aln; deposited aln; interfacial properties ... See more keywords
Understanding Effects Responsible for Pinhole Development and Coating Adhesion for Atomic Layer Deposited Coatings on Glass
Sign Up to like & getrecommendations! Published in 2018 at "Microscopy and Microanalysis"
DOI: 10.1017/s1431927618011340
Abstract: Glass degradation, referred to broadly as glass disease in cultural heritage contexts, presents a particularly significant challenge for art and museum conservation. Caused by contact between a glass surface and water, or other acidic species… read more here.
Keywords: glass; atomic layer; layer deposited; understanding effects ... See more keywords
Enhanced Thermoelectric Transport and Stability in Atomic Layer Deposited HfO2/ZnO and TiO2/ZnO Sandwiched Multilayer Thin Films.
Sign Up to like & getrecommendations! Published in 2020 at "ACS applied materials & interfaces"
DOI: 10.1021/acsami.0c11439
Abstract: Herein, enhancements in thermoelectric performance, both power factor and thermal stability, are exhibited by sandwiching HfO2 and TiO2 layers onto atomic layer deposited ZnO thin films. High temperature thermoelectric measurements from 300 to 450 K… read more here.
Keywords: tio2; thin films; atomic layer; zno ... See more keywords
Chemically Stable Atomic-Layer-Deposited Al2O3 Films for Processability
Sign Up to like & getrecommendations! Published in 2017 at "ACS Omega"
DOI: 10.1021/acsomega.7b00443
Abstract: Atomic-layer-deposited alumina (ALD Al2O3) can be utilized for passivation, structural, and functional purposes in electronics. In all cases, the deposited film is usually expected to maintain chemical stability over the lifetime of the device or… read more here.
Keywords: microscopy; layer; atomic layer; layer deposited ... See more keywords
Atomic layer deposited photocatalysts: comprehensive review on viable fabrication routes and reactor design approaches for photo-mediated redox reactions
Sign Up to like & getrecommendations! Published in 2019 at "Journal of Materials Chemistry A"
DOI: 10.1039/c9ta04780h
Abstract: The potential synthesis approaches in fabricating a photocatalyst using atomic layer deposition. read more here.
Keywords: photocatalysts comprehensive; comprehensive review; atomic layer; review viable ... See more keywords