In silico design of a thermal atomic layer etch process of cobalt
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DOI: 10.1116/6.0000804
Abstract: Thermal atomic layer etch (ALE), facilitating the removal of up to one monolayer of material per cycle, is growing in importance for thin-film processing. The number of available ALE processes is much smaller than for… read more here.
Keywords: atomic layer; process; etch; layer etch ... See more keywords