Single-Step Dual-Layer Photolithography for Tunable and Scalable Nanopatterning.
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DOI: 10.1021/acsnano.1c03703
Abstract: Conventional photolithography, due to its scalability, robustness, and straightforward processes, has been widely applied to micro- and nanostructure manufacturing in electronics, optics, and biology. However, optical diffraction limits the ultimate resolution of conventional photolithography, which… read more here.
Keywords: dual layer; conventional photolithography; single step; layer photolithography ... See more keywords