Dielectric properties and reliability enhancement of atomic layer deposited thin films by in situ atomic layer substrate biasing
Sign Up to like & getrecommendations! Published in 2020 at "Journal of Materials Chemistry C"
DOI: 10.1039/d0tc02346a
Abstract: A novel “atomic layer substrate biasing (ALSB)” technique is proposed to improve the dielectric properties including film density, dielectric constant (K), and leakage current density (Jg) and the reliability of nanoscale thin films. In the… read more here.
Keywords: thin films; layer; atomic layer; substrate biasing ... See more keywords
STUDY OF THE EFFECT OF THE BUFFER LAYER ON THE SUBSTRATE SURFACE AND THE PROCESS MEDIUM ON NANOCLUSTER FORMATION IN THE Si1 – xGex STRUCTURE
Sign Up to like & getrecommendations! Published in 2019 at "Nanotechnologies in Russia"
DOI: 10.1134/s1995078019060168
Abstract: In this paper, we report the experimental results of the effect of the initial buffer layer on the substrate surface and the process medium on the possibility and features of the formation of Si1 –… read more here.
Keywords: surface; buffer layer; effect; substrate surface ... See more keywords